Karl Suss MA56 Contact Aligner
| Overview |
| Our Karl Suss MA56 Contact Aligner is for use with 4" wafers and 5" masks, although smaller wafers and chips may be mounted to a 4" carrier wafer and processed. The light source is 365 nm mercury arc lamp at 10 mW/cm². Vacuum and contact modes are available. The microscope has dual alignment objectives and split-field viewing. The mask and microscope have motorized motion in x and y, and they may be moved together or independently over the stationary wafer. |
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4" wafers, 5" masks
365 nm Hg arc lamp, 10 mW/cm²
±1 cm motorized motion of microscope and mask in x and y
Dual independent objectives with variable split field view |
| Suresh Santhanam |
santh@ece.cmu.edu |
REH 301 |
x8-2026 |
 | Carnegie Mellon Nanofabrication Facility • ECE Department
Pittsburgh, PA 15213-3891 USA
412-268-2471 - (FAX) 412-268-4323
copyright 2006 Carnegie Mellon |
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