Equipment : Commonwealth Scientific Ion Beam Deposition System
- Three targets, 6", water cooled
- Two permanent magnet Kaufman-type ion beam guns
- 16 cm gun for substrate etching
- 8 cm gun for target deposition
- CSC IBS 600 power supplies
- Secondary sputtering gas available: Nitrogen
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.