Equipment : STS Multiplex ICP RIE
- Bosch process license for anisotropic silicon etch
- Isotropic silicon etch
- RIE with Inductively Coupled Plasma
- 1200 W coil power supply, 300 W platen power supply
- Four wafer carousel, 4" wafers
Note: Staff approval must be given EVERY TIME this machine is to be used.
Available Gases: SF6, C4F8, O2, Ar.
Please consult Nanofab staff for process specifics.