Equipment : Leybold Heraeus Z-650
- Two chambers, one 5" target or two 75 mm targets each
- Load-lock; liquid nitrogen Meissner traps and turbo pump on each chamber
- 500 W DC power supplies, 600 W RF power supplies, sputter etch
- Advanced Energy Pinnacle Plus Pulsed DC power supply
- Secondary gas available: methane
Available Targets: Please discuss with the staff.
Please consult Nanofab staff for process specifics.